When creating a Hatch or any other pattern, only the Points method has the option to add a fill pattern. It would be useful have that option for all relevant methods (Flood, Union etc).

The Bentley application populates a configuration variable which says how the application was launched: _USTN_LAUNCHMETHOD Launch Mode would allow an Administrator to design configuration around the way the application is loaded. For example a dou...

A NEW Configuration variable called 'CADFile,UCF' A new Configuration Level called 'File'. This Level loads after the User Level. A lower Configuration Level. This configuration file reads after the Personal.ucf and is read and resolved each time ...

Request that the Personal.ucf be re-read and re-resolved as a pre-process each time a new CAD file is opened so that variables in particular like _DGNLib will have a new path which will queried and resolved before application Runtime including oth...

Be able to add a leader to an existing note.

please update the configuration explorer to handle # configurations now I can not select what I want to see in the explorer, something is used to generate the variables but we can not see what is loaded, or choose the wanted configuration. I have ...

Mass Properties should show the units. Better even separated by thousands and decimal point depending on regional configuration. You should choose features from Setting Preference

Accudraw does not show units. If the numbers are large it is difficult to see without a thousands separator. Idea: Accudraw should have the possibility of showing units, separating by thousands and the possibility of incorporating the decimal poin...

We always have to use an Autorun Macro to enable Reference Level Overrides for every session because we alsways want to save Reference Level states in our container files. Addition of a variable that allows this to always be turned on would make i...

Implement quick search for selecting layers from WMS server. Now it is tiresome to select manually from long list of layers.